During the project significant new knowledge was developed, which has led to 4 patent families, 400% more than the initial target of 1 patent. Two of them are already submitted, while 2 more are being written. The patent families are the following:

a) Large Area Uniform Atmospheric Pressure Plasma Processing Device, Greek Patent Application No 20150100397

b) Gaseous Plasma nanotextured substrates for selective enrichment of cancer cells, Greek Patent Application No 201401100142, EP2918675NWA1

c) Α Variable Shield for Sputtering Control in Plasma Reactors, and Controlled Roughness Formation on Plasma Processed Substrates (under preparation)

d) Dual mode antenna for inductive or helicon plasma generation (under preparation)

Large Area, Uniform, Atmospheric Pressure Plasma Processing Device

Summary

A Large Area, Uniform, Atmospheric Pressure Plasma Processing device is proposed comprising a first dielectric material (3.1) metalized on one side by a first powered metal (2.1), having on the other side a second patterned metallic layer (4) in the form of an antenna, the antenna being powered or floating and being covered conformally by a second dielectric (3.2), the whole electrode / dielectric sandwich construction being perforated with holes and separated by an air gap from a processed sample which is sitting on a third grounded metal (2.2) electrode facing the second dielectric optionally covered with a third dielectric (3.3).

Gaseous Plasma nanotextured substrates for selective enrichment of cancer cells

Summary

The present invention concerns the use of hierarchical, randomly roughened in the micro and nanoscale, (also referred to as “nanotextured”) polymeric or polymer coated substrates with optimized nanotexture morphology typically fabricated using gaseous plasma etching for increased cancer cell adhesion, and proliferation compared to normal cells.