Scope and Topics

CVD-XVI /EUROCVD-14 continues the tradition of CVD Symposia sponsored by the Electrochemical Society (beginning in 1970) and European CVD conferences begun in Paris (1977). The last joint meeting was held in Paris (1977); EUROCVD - 13 was held in Athens, Greece (2001) and CVD-XV was held in Toronto (2000). These conferences offer a comprehensive review of the most recent research on chemical vapor deposition and related topics.

CVD is one of the most versatile processes for manufacturing thin films and is currently used to manufacture products ranging from semiconductor devices to low-emissivity coatings on glass to micromachines. This conference will provide an opportunity to present and review new research on both fundamental and applied topics, to exchange ideas, and promote international cooperation.

Papers describing the use of CVD to deposit novel materials (such as nanoscale- and biomaterials, polymers, transparent conducting oxides (TCO), electrochromics and micromachines) are particularly encouraged, as are papers discussing the application of new theoretical methods for modeling materials (such as density functional theory (DFT) and all-electron methods.

Abstracts Submission

By September 13, 2002, send 100-word abstracts and full author names, adresses, telephone and fax numbers and email adresses to:

Upon receipt of the abstract, detailed instructions for preparing manuscripts will be mailed to autors. The second announcement will only be sent to the authors who have completed the attached preliminary form. Please note: the official language of the conference is English.

International Organizing Committee